10.14489/td.2022.12.pp.034-038

2022, 12 December

DOI: 10.14489/td.2022.12.pp.034-038

Moroz A. V., Rumyantseva D. E., Filimonov V. E., Aleksandrov I. K.
TECHNIQUE FOR OPERATIONAL CONTROL OF THE DEGREE OF CONTAMINATION OF MICROELECTRONICS SUBSTRATES WITH ORGANIC CONTAMINANTS
(pp. 34-38)

Abstract. A technique for ope rational control of the degree of contamination of microelectronic substrates with organic impurities is presented by the wetting angle of a controlled substrate by a drop of liquid. The technique consists in forming a drop of distilled water on the surface of the substrate under study, photographing the drop and using the resulting image, determining the relative roughness and degree of contamination of the substrate with organic impurities. The operability of the technique has been experimentally proved using the example of substrates made of glass, glass-ceramic and silicon. The deviation of measurements of substrate contamination measured by the proposed method relative to the data obtained by atomic force microscopy does not exceed 3 %. The technique allows, while increasing the accuracy of measuring the degree of contamination, to reduce the time of this control, while ensuring the safety of the controlled substrates. At the same time, to reduce the time of using specialized equipment for the purpose of monitoring the degree of contamination of the substrates.

Keywords: contamination of microelectronic substrates, wettability angle, operational control, roughness.

+ - About the Authors Click to collapse

A. V. Moroz (Federal State Budgetary Educational Institution of Higher Education “Volga State University of Technology”, Yoshkar-Ola, Resp. Mari El, Russia) E-mail: morozandrey2405@ mail.ru
D. E. Rumyantseva (Joint stock Company “Mari Machine Building Plant”, Yoshkar-Ola, Resp. Mari El, Russia)E-mail: Данный адрес e-mail защищен от спам-ботов, Вам необходимо включить Javascript для его просмотра.
V. E. Filimonov, I. K. Aleksandrov (Federal State Budgetary Educational Institution of Higher Education “Volga State University of Technology”, Yoshkar-Ola, Resp. Mari El, Russia) E-mail: FilimonovVE@ volgatech.net, Данный адрес e-mail защищен от спам-ботов, Вам необходимо включить Javascript для его просмотра.

+ - References Click to collapse

1. Filimonov V. E., Sushentsov N. I. (2011). Technology for cleaning substrates of micro- and nanoelectronics: textbook. Ministry of Education and Science of the Russian Federation, Mari State Technological University. Yoshkar-Ola: MarGTU. [in Russian language]
2. Maskaeva L. N. (Ed.), Fedorova E. A., Markov V. F. (2019). Technology of thin films and coatings: textbook. Ministry of Science and Higher Education of the Russian Federation. Ural Federal University. Ekaterinburg: Izdatel'stvo Ural'skogo universiteta. [in Russian language]
3. Shugurov A. R., Panin A. V. (2020). Mechanisms of stress initiation in thin films and coatings. Zhurnal tekhnicheskoy fiziki, Vol. 90, (12), pp. 1971 – 1994. [in Russian language]
4. Truhachev A. V., Truhacheva N. S., Sednev M. V., Aleev R. M. (2020). Method for controlling contamination of the surface of a semiconductor wafer by changing the roughness. Uspekhi prikladnoy fiziki, Vol. 8, (5), pp. 364 – 369. [in Russian language]
5. Mironov V. L. (2004). Fundamentals of scanning probe microscopy: textbook. Nizhniy Novgorod: RAN; Institut fiziki mikrostruktur. [in Russian language]
6. Krylova T. N., Bohonskaya I. F., Karapetyan G. A. (1980). Measurement of transparent films on the glass surface by ellipsometric and spectrophotometric methods. Optika i spektroskopiya, Vol. 49, (4), pp. 802 – 808. [in Russian language]
7. Nevlyudov I. Sh., Zharikova I. V., Perepelitsa I. D., Reznichenko A. G. (2014). Analysis of methods for controlling the roughness of substrates for electronic products. Vostochno-Evropeyskiy zhurnal peredovyh tekhnologiy, Vol. 2, 68(5), pp. 25 – 29. [in Russian language]
8. Shutov D. A., Sitanov D. V. (2006). Processes of micro- and nanotechnologies: laboratory workshop. Part 2. Ivanovo: GOUVPO Ivanovskiy gosudarstvenniy himiko-tekhnologicheskiy universitet. [in Russian language]
9. Borodin S. A., Volkov A. V., Kazanskiy N. L. (2005). Automated device for assessing the degree of cleanliness of a substrate by the dynamic state of a liquid drop applied to its surface. Komp'yuternaya optika, 28, pp. 69 – 75. [in Russian language]
10. Moroz A. V., Rumyantseva D. E. (2022). Method for measuring surface contamination of microelectronic substrates. Ru Patent No. 2775163. Russian Federation. [in Russian language]
11. Hoorfar M., Neumann A. W. (2004). Axisymmetric Drop Shape Analysis (ADSA) for the determination of surface tension and contact angle. Journal of Adhesion, 80, pp. 727 – 743. DOI: 10.1080/00218460490477684
12. Marchuk I. V., Cheverda V. V., Strizhak P. A., Kabov O. A. (2015). Determination of surface tension and contact angle of wetting from the shape of the surface of axisymmetric bubbles and drops. Teplofizika i aeromekhanika, Vol. 22, (3), pp. 311 – 317. [in Russian language]

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