10.14489/td.2025.12.pp.077-088

2025, 12 December

DOI: 10.14489/td.2025.12.pp.077-088

Topolianskii P. A., Ermakov S. A., Topolianskii A. P.
METHODS OF MEASURING THE THICKNESS OF THIN-FILM COATINGS
(pp. 77-88)

Abstract. The article examines destructive and non-destructive methods for determining the thickness of non-metallic thin-film coatings (hereinafter referred to as coatings): interference, ellipsometric, profilometric, calotesting, microscopic, and approximation of dielectric properties. The paper presents their methodology and application examples for glass-ceramic and diamond-like coatings deposited by the hybrid technology of reactive atmospheric plasma-activated deposition (APARD). This process combines the advantages of chemical and physical vapor deposition (PVD/CVD) with cold atmospheric plasma (CAP) processes, providing atmospheric pressure deposition of functional coatings with a thickness of 100 nm to 3 μm. Coatings are deposited by this method on a circle area in the non-moving mode, and on a rectangular strip area in the moving mode. In both cases, the coating has a variable thickness over the application area. Depending on the measurement method, the concept of “coating thickness” is interpreted differently ‒ at a specific point, in a given area, between the midlines.

Keywords: coating thickness, thin-film coatings, nanocoatings, coating deposition, coating application, hardening, calotesting.

+ - About the Authors Click to collapse

P. A. Topolianskii (Plasmacentre Ltd, St. Petersburg, Russia) E-mail: Данный адрес e-mail защищен от спам-ботов, Вам необходимо включить Javascript для его просмотра.
S. A. Ermakov (Peter the Great St. Petersburg University, St. Petersburg, Russia) E-mail: Данный адрес e-mail защищен от спам-ботов, Вам необходимо включить Javascript для его просмотра.
A. P. Topolianskii (Plasmacentre Ltd, St. Petersburg, Russia) E-mail: Данный адрес e-mail защищен от спам-ботов, Вам необходимо включить Javascript для его просмотра.

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