10.14489/td.2015.07.pp.041-046

2015, 07 July

DOI: 10.14489/td.2015.07.pp.041-046

Kalmykov A. V., Ermakov S. A., Topoljanskij P. A., Bodrov S. G.
MONITORING THE ELECTRICAL PERFORMANCE OF THE THIN-FILM COATINGS DEPOSITED IN FINISHING PLASMA HARDENING PROCESS
(pp. 41-46)

Abstract. One of the main characteristics of the thin-film coatings laid by physical and chemical vapor deposition is evenness of its thickness. During the process of chemical deposition in finishing plasma hardening method – nonaerated and beadless nanocomposite covering with PECVD by cold atmospheric plasma – the coating thickness monitoring can be performed by usage of the information on the electrical per-formance of the given coating acquired during the covering process. It is suggested a method of nondestructive control for monitoring the coating thickness and quality by measurement of its resistance with DC power supply, as well as by a more complex measurement design with an additional AC power supply that allows to define the components of the complex resistance in the circuit unit including the coating.

Keywords: coating, deposition, hardening, coating thickness, electrical performance.

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A. V. Kalmykov, S. A. Ermakov, P. A. Topolyanskiy, S. G. Bodrov
Saint Petersburg State Polytechnic University, Saint Petersburg, Russia. E-mail: Данный адрес e-mail защищен от спам-ботов, Вам необходимо включить Javascript для его просмотра.

+ - References Click to collapse

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DOI: 10.14489/td.2015.07.pp.041-046

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